Atomic layer deposition is a method of plating a layer of material on the surface of a substrate in the form of a single atomic film. There are similarities to common chemical deposition, but in the process of atomic layer deposition, the chemical reaction of the new layer of atomic film is directly associated with the previous layer in such a way that only one layer of the atom is deposited per reaction. Monoatomic layer deposition cycle can be divided into four steps: introducing a first precursor gas into the substrate, adsorbing or reacting with the surface of the substrate, flushing the residual gas with an inert gas, and introducing a second precursor gas; generating a coating by a chemical reaction with a first precursor gas adsorbed on the surface of the substrate, or continuing to react with a product which reacts with the first precursor and the substrate to generate a coating; and washing the excess gas with the flushing gas again. The precise control of the film thickness can be achieved by controlling the deposition cycle.
Uniform and dense with no holes；
An excellent three-dimensional conformal chemical measurement film can be generated as a coating of a step cover and a nano-hole material；
The film growth can be carried out at a low temperature (room temperature of 400°C)；
The film thickness can be simply and accurately controlled；
Widely applicable to substrates of different shapes；
There is no need to control the uniformity of reactant flow.
The invention relates to a novel solar cell field, such as a perovskite battery, superconducting dielectric film, and it's widely used in the capacitors, memory, diodes, transistors, etc. The optical film is prepared by the technology, and the metal halide, the organic metal and the H2, NH3, H2O, which are generally selected as the reaction precursor, and the single crystal Si or the glass is used as the substrate to prepare thin film of Al2O3, ZnO, etc. In the fields such asaerospace engines where high temperature and oxidation resistance is required, such as the preparation of Y2O3-ZrO2 (YSZ) thin films by ALD method, those thin films are used as thermal insulation layer of engine cylinders.
