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Laser Heating System

Laser Heating System designing and manufacturing

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Product introductionProduct parameters

Including infrared laser, pyrometer, optical fiber, focus lenses, sample stage, etc.;

Compatible with high temperature and high oxygen pressure; long lifetime.

Compatibe with Pulsed Laser Deposition System, and systems which is suitable for small substrate; the laser heating is compatiible with resistive heating.


Heating temperature: up to 1100°C

Wafer size: 10mm X 10mm

Heating stability: ±1°C

Ramp rate: better than 400°C/min

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